People
Yongmin Kim

Yongmin Kim

Address

Stanford University
Building/Rm: 530 - 113
Stanford, CA 94305

E-Mail

Additional Information

Education

  • M.S., Korea Advanced Institute of Science and Technology (KAIST), Mechanical Engineering, 2009
  • B.S., Korea Advanced Institute of Science and Technology (KAIST), Mechanical Engineering, 2007

References

7 document(s) found.
[1]

J. Provine, Peter Schindler, Yongmin Kim, Steve P. Walch, Hyo Jin Kim, Ki-Hyun Kim, and Fritz B. Prinz, "Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride", AIP Advances, vol. 6, pp. 65012-65012, 2016.
Yongmin Kim, J. Provine, Stephen P. Walch, Joonsuk Park, Witchukorn Phuthong, Anup L. Dadlani, Hyo-Jin Kim, Peter Schindler, Kihyun Kim, and Fritz B. Prinz, "Plasma-Enhanced Atomic Layer Deposition of SiN–AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid", ACS Appl. Mater. Interfaces, vol. 8 (27), pp. 17599-17605, 2016.
Yongmin Kim, Peter Schindler, Anup L. Dadlani, Shinjita Acharya, J. Provine, Jihwan An, Fritz B. Prinz, "Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation ", Acta Materialia, vol. 117, pp. 153-159, 2016.
Jan Torgersen, Shinjita Acharya, Anup Lal Dadlani, Ioannis Petousis, Yongmin Kim, Orlando Trejo, Dennis Nordlund, Fritz Prinz, "Relating Electronic and Geometric Structure of Atomic Layer Deposited BaTiO3 to its Electrical Properties.", Journal of Physical Chemistry Letters, vol. 7, pp. 1428-1433, 2016.
Shinjita Acharya, Jan Torgersen, Yongmin Kim , Joonsuk Park , Peter Schindler , Anup L. Dadlani , Martin Winterkorn , Shicheng Xu , Stephen P. Walch , Takane Usui , Christian Schildknecht and Fritz B. Prinz , "Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor", Journal of Material Chemistry C, vol. 4, pp. 1945-1952, 2016.
M M Winterkorn, A L Dadlani, Y Kim, J Provine, FB Prinz, "ETCH “sandbox”: Controlled release dimensions through atomic layer deposition etch stop with trench refill and polish", 2015 Transducers - 2015 18th International Conference on Solid-State Sensors, Actuators and Microsystems (TRANSDUCERS), pp. 2272-2275, 2015.
Peter Schindler, Yongmin Kim, Dickson Thian, Jihwan An, Fritz B. Prinz, "Plasma-enhanced atomic layer deposition of BaTiO3", Scripta Materialia, 2015.
[1]


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