Stephen P. Walch
Address
Stanford University
Building/Rm: Others
Stanford, CA 94305
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References
4 document(s) found.
J. Provine, Peter Schindler, Yongmin Kim, Steve P. Walch, Hyo Jin Kim, Ki-Hyun Kim, and Fritz B. Prinz, "Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride", AIP Advances, vol. 6, pp. 65012-65012, 2016. Yongmin Kim, J. Provine, Stephen P. Walch, Joonsuk Park, Witchukorn Phuthong, Anup L. Dadlani, Hyo-Jin Kim, Peter Schindler, Kihyun Kim, and Fritz B. Prinz, "Plasma-Enhanced Atomic Layer Deposition of SiN–AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid", ACS Appl. Mater. Interfaces, vol. 8 (27), pp. 17599-17605, 2016. Shinjita Acharya, Jan Torgersen, Yongmin Kim , Joonsuk Park , Peter Schindler , Anup L. Dadlani , Martin Winterkorn , Shicheng Xu , Stephen P. Walch , Takane Usui , Christian Schildknecht and Fritz B. Prinz , "Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor", Journal of Material Chemistry C, vol. 4, pp. 1945-1952, 2016. [1]
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