Nanoscale Prototyping
Laboratory

for
Energy Conversion and Storage

People

RPL Alumni

Kihyun Kim

Address

E-Mail

References

3 document(s) found.

[1]

J. Provine, Peter Schindler, Yongmin Kim, Steve P. Walch, Hyo Jin Kim, Ki-Hyun Kim, and Fritz B. Prinz, "Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride", AIP Advances, vol. 6, pp. 65012-65012, 2016.

Yongmin Kim, J. Provine, Stephen P. Walch, Joonsuk Park, Witchukorn Phuthong, Anup L. Dadlani, Hyo-Jin Kim, Peter Schindler, Kihyun Kim, and Fritz B. Prinz, "Plasma-Enhanced Atomic Layer Deposition of SiN–AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid", ACS Appl. Mater. Interfaces, vol. 8 (27), pp. 17599-17605, 2016.

Jihwan An, Takane Usui, Manca Logar, Joonsuk Park, Dickson Thian, Sam Kim, Kihyun Kim, and Fritz B. Prinz , "Plasma Processing for Crystallization and Densification of Atomic Layer Deposition BaTiO3 Thin Films ", ACS Appl. Mater. Interfaces, vol. 6(13), pp. 10656-10660, 2014.

[1]