
RPL Alumni
Peter Schindler
Address
- E-Mail

References
12 document(s) found.
J. Provine, Peter Schindler, Yongmin Kim, Steve P. Walch, Hyo Jin Kim, Ki-Hyun Kim, and Fritz B. Prinz, "Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride", AIP Advances, vol. 6, pp. 65012-65012, 2016. Yongmin Kim, J. Provine, Stephen P. Walch, Joonsuk Park, Witchukorn Phuthong, Anup L. Dadlani, Hyo-Jin Kim, Peter Schindler, Kihyun Kim, and Fritz B. Prinz, "Plasma-Enhanced Atomic Layer Deposition of SiN–AlN Composites for Ultra Low Wet Etch Rates in Hydrofluoric Acid", ACS Appl. Mater. Interfaces, vol. 8 (27), pp. 17599-17605, 2016. Yongmin Kim, Peter Schindler, Anup L. Dadlani, Shinjita Acharya, J. Provine, Jihwan An, Fritz B. Prinz, "Plasma-enhanced atomic layer deposition of barium titanate with aluminum incorporation
", Acta Materialia, vol. 117, pp. 153-159, 2016. Dickson Thian, Yonas T. Yemane, Manca Logar, Shicheng Xu, Peter Schindler, Martin M. Winterkorn, J Provine, and Fritz B. Prinz, "Atomically Flat Silicon Oxide Monolayer Generated by Remote Plasma", Journal of Physical Chemistry C, vol. 120 (15), pp. 8148-8156, 2016. Shinjita Acharya, Jan Torgersen, Yongmin Kim , Joonsuk Park , Peter Schindler , Anup L. Dadlani , Martin Winterkorn , Shicheng Xu , Stephen P. Walch , Takane Usui , Christian Schildknecht and Fritz B. Prinz , "Self-limiting atomic layer deposition of barium oxide and barium titanate thin films using a novel pyrrole based precursor", Journal of Material Chemistry C, vol. 4, pp. 1945-1952, 2016. A. Dadlani, O.Trejo, S. Acharya, J. Torgersen, I. Petousis, D. Nordlund, R. Sarangi, P. Schindler, F. Prinz, "Exploring local electronic structure and geometric arrangement of ALD Zn(O,S) buffer layers using X-Ray Absorption spectroscopy", Journal of Materials Chemistry C, vol. 3, pp. 12192-12198, 2015.